噻吩在Cu^+-13X上吸附平衡和动态数据测定  

Adsorption equilibrium and dynamic data measurement of thiophene on Cu^+-13X

作　　者：祝宁东[1] 孙海燕[1] 居沈贵[1] 

机构地区：[1]南京工业大学化学化工学院,江苏南京210009

出　　处：《化工科技》2008年第1期16-18,共3页Science & Technology in Chemical Industry

基　　金：江苏省重点实验室开放课题资助项目(KJS03017)

摘　　要：对噻吩在Cu+-13X分子筛上的吸附平衡和动态数据进行了测定。对噻吩的吸附平衡数据用Langmuir模型进行拟合,得到了303、323 K下噻吩在Cu+-13X上的饱和吸附量分别为232.86、74.78 mg/g;采用固定床测定了不同停留时间及不同初始浓度下的动态透过曲线,结果表明,在透过点以前动态吸附可以实现噻吩的零含量,缩短停留时间和增加初始浓度会影响吸附的透过曲线,实验结果为吸附工艺设计提供了一定的基础数据。The adsorption equilibrium and dynamic data of thiophene on Cu^＋-13X were measured in this paper. The isothermal adsorption data of the system were fitted with Langmuir Model. At 303 K and 323 K, the adsorption saturation capacity of thiophene on Cu^＋-13X was 232.86 mg/g and 74.78mg/g respectively. The breakthrough curves in fixed-bed were also measured under the conditions of different inlet concentration and different resident time. The curves showed that dynamic adsorption could achieve zero content of thiophene before breakthrough point under such conditions. Shortening resident time and increasing the inlet concentration of thiophene would affect the adsorption break-through cureves. These results can provide the basis for design of adsorption process.

关 键 词：噻吩 Cu^+-13X分子筛 吸附平衡 透过曲线 

分 类 号：TQ424.25[化学工程]