高分辨显微镜纳米云纹方法的发展与应用  

Development and application of nano-moiré method with high-resolution microscopy

作　　者：刘战伟[1] 李建国 李渴忻[1] 谢惠民[3] 方岱宁[3] 廖力[1] 

机构地区：[1]北京理工大学理学院力学系,北京100081 [2]山东王晁煤电集团新宏煤业有限公司,山东枣庄277400 [3]清华大学工程力学系破坏力学重点实验室,北京100084

出　　处：《光学技术》2008年第2期294-297,共4页Optical Technique

摘　　要：介绍了近年来发展的纳米云纹法及其新的应用。这些方法是基于原子力显微镜、扫描隧道显微镜和透射电子显微镜的原理提出来的。纳米云纹法能够对物体的微/纳观变形提供定量的分析。详述了这些方法的测量原理和实验技术,并进行了新的应用研究。实验结果论证了这些方法的可行性,并证实了这些方法具有纳米级的位移测量灵敏度。Some novel nano-moiré methods have been developed.An introduction of these new methods is offered,which can be realized under the atomic force microscope,scanning tunneling microscope,as well as the transmission electron microscope.These nano-moiré methods are able to offer quantitative analysis to nano-deformation of object.The measurement principles and experimental technique of these methods are described.A new digital nano-moiré technique is proposed.Some typical applications to these methods are discussed.The experimental results demonstrate the feasibility of these methods and also verify the methods can offer a high sensitivity for displacement measurement with nano-meter spatial resolution.

关 键 词：高分辨率显微镜 纳米云纹 纳米测量 晶格 

分 类 号：O436[机械工程—光学工程]