二次离子质谱分析技术及应用研究  

SIMS Analysis Technology and the Applied Research

作　　者：尹会听[1] 王洁[1] 

机构地区：[1]浙江海洋学院物理实验中心

出　　处：《光谱实验室》2008年第2期180-184,共5页Chinese Journal of Spectroscopy Laboratory

摘　　要：二次离子质谱(SIMS)是离子质谱学的一个分支,也是表面分析的有利工具。该方法能检测出微小区域内的微量成分,绝对检出限10-13—10-19g、相对检出限ppm—ppb;具有能进行杂质深度剖析和各种元素在微区范围内同位素丰度比的测量。结合IMS-6f型二次离子质谱仪器,本文对SIMS仪器和技术应用进行了综述。Secondary ion mass spectrometry （SIMS） is a branch of the ion mass spectrometry and a favorable surface analysis tool. This technique can detect trace elements in the troy region, which absolute detection limit is 10^-13 - 10^-19g and the relative detection limit is ppm-ppb. It can determine impurities and isotope abundance ratio in the tiny area. Based on IMS-6f secondary ion mass spectrometry, the SIMS equipment and technology applications were reviewed.

关 键 词：二次离子质谱(SIMS) IMS-6f型 

分 类 号：O657.63[理学—分析化学]