纳米ZnO和ZnO-SiO_2复合薄膜的光学性质研究  

Study of optical properties of nano-scale ZnO and ZnO-SiO_2 thin films

作　　者：袁宁一[1] 何泽军[1] 赵常宁[1] 李峰[1] 周懿[1] 李金华[1] 

机构地区：[1]江苏工业学院数理学院,常州213164

出　　处：《物理学报》2008年第4期2537-2542,共6页Acta Physica Sinica

基　　金：江苏省自然科学基金(批准号:BK2006042)资助的课题~~

摘　　要：通过溶胶凝胶(sol-gel)法分别在玻璃衬底上制备了ZnO纳米薄膜和ZnO-SiO2纳米复合薄膜,并利用紫外-可见光分光光度计对薄膜的光学性能进行了分析.可见光-紫外透射谱显示,随着ZnO溶胶浓度从0.7mol/L降低到0.006mol/L,制备的ZnO薄膜从只出现一个380nm(对应的光学禁带宽度为3.27eV)左右的吸收边到在380和320nm(对应的光学禁带宽度为3.76eV)左右各出现一个吸收边,并且随着ZnO溶胶浓度的降低,在380—320nm波段内的透过率明显提高.而ZnO-SiO2复合薄膜只在310nm左右出现一个吸收边.SiO2的包覆宽化了ZnO的禁带宽度,包覆后的禁带宽度可达到3.87eV.ZnO and ZnO-SiO2 nano-scale thin films were deposited on glass substrates by the sol-gel method. The ultraviolet（ UV）visible speetrophotometer was used to analyze their optical properties. The UV-visible transmittance spectra of ZnO films showed that when the mole concentration of ZnO precursor decreased from 0.7 to 0.06 mol/L, besides the absorption edge at 380 nm, a new absorption edge around 320 nm appeared. Furthermore the decrease of mole concentration of ZnO precursor improved the transmittance in the range between 380 and 320 nm. However, ZnO-SiO2 nano-seale thin films only have one absorption edge at 310 nm. The optical band gap of ZnO was enlarged when deposited in SiO2 matrix.

关 键 词：纳米ZNO ZnO-SiO2复合薄膜 溶胶凝胶法 透射率 

分 类 号：TB383.1[一般工业技术—材料科学与工程]