玻璃基体化学镀Ni-P合金  

Electroless Ni-P Plating on Glass Substrates

作　　者：李茸 刘祥萱 王煊军 

机构地区：[1]西安高科技研究所503室,陕西西安710025

出　　处：《电镀与精饰》2008年第4期30-33,共4页Plating & Finishing

摘　　要：通过调整镀液成分，优化温度、pH、施镀时间等工艺参数，获得了在玻璃基体沉积光亮Ni—P合金镀层的化学镀工艺；分析了镀层含磷量以及基体表面性质等对镀层光亮度和结合力的影响；性能测试结果证明镀层有较好的光亮度和结合力，磷的质量分数为10％～11％。An improved technology process of bright Ni-P electroless plating on glass surface was gained by adjusting process parameters such as bath composition, temperature, pH value and plating time. The effects of phosphorus content in the plating and surface properties of glass on the brightness and adhesion of the Ni-P plating were analysed. The results of performance measurements show that the Ni-P plating has excellent brightness and adhesion, and the phosphorus content in the plating was 10% - 11%.

关 键 词：化学镀NI-P合金 结合力 光亮 玻璃 

分 类 号：TQ153.2[化学工程—电化学工业]