射频等离子体聚合沉积六甲基二硅氧烷  

Deposition of hexamethyldisiloxane film by RF plasma polymerization

作　　者：王迎[1] 李淳[1] 

机构地区：[1]大连工业大学纺织轻工学院,辽宁大连116034

出　　处：《大连工业大学学报》2008年第1期76-79,共4页Journal of Dalian Polytechnic University

基　　金：辽宁省教育厅科学研究计划资助项目(05L083)

摘　　要：为研究新颖环保的材料表面改性技术,通过射频等离子体聚合方法聚合沉积六甲基二硅氧烷(HMDSO)薄膜,并使用发射光谱、红外光谱、扫描电镜、原子力显微镜等测试方法,研究了HMDSO聚合膜的化学结构和物理形貌。实验结果表明,等离子体放电空间内的活性粒子对聚合膜的组成有直接影响。HMDSO等离子体聚合膜中含有Si—O、—CH3、—OH、C O、C—O等官能团,其表面形貌为微米颗粒堆积膜,是一种新颖的聚合物膜。The ultra-thin hexamethyldisiloxane （HMDSO） film was deposited by RF plasma polymerization in this study. Optic emission spectrum （OES） was used to distinguish the active species in HMDSO plasma. The chemical structure and physical morphology of the film were investigated by Fourier transform infrared （FTIR） （AFM）. The OES results showed , scanning electron micro that the active species in P ope （SEM） and atomic force microscope lasma directly determined the molecular components of polymerized film. As shown in FTIR, the HMDSO plasma polymer contained Si-O, -CH3, -OH, C -O, C-O and other functional groups. SEM and AFM indicated that pulsed plasma polymer was composed of submicron particles, which is a new form of polymerization film.

关 键 词：等离子体聚合 射频放电 六甲基二硅氧烷 

分 类 号：O539[理学—等离子体物理]