纳米非晶Si_3N_4粉的超高压低温烧结  

ULTRAHIGH PRESSURE SINTERING OF NANO AMORPHOUS Si_3N_4 POWDERS AT LOW TEMPERATURE

作　　者：李亚利[1] 梁勇[2] 佟百运[2] 郑丰[2] 马贤峰[2] 崔硕景[2] 赵伟[2] 

机构地区：[1]中国科学院金属研究所微晶与激光加工研究室,沈阳市110015 [2]中国科学院金属研究所

出　　处：《材料研究学报》1997年第5期473-478,共6页Chinese Journal of Materials Research

基　　金：国家自然科学基金!59472013

摘　　要：用六面顶超高压在1.0－5.0GPa，25～1500℃条件下烧结激光法制备的纳米非晶Si3N4粉，有“冷烧结”特代表现为：在5GPa，室温下压制的块体密度达理论值的93％，这是高压下纳米粒子产生流变的结果当烧结温度较低（800～950℃）时，高压烧结体为棕色透明的致密（98％）纳米非晶块体；烧结温度较高（1300～1500℃）时，形成纯白色致密纳米晶Si3N4块体，硬度为15.53～1605GPa研究表明，超高压烧结纳米陶瓷粉可显著降低烧结温度，控制晶粒生长。The sintering behavior of the laser-synthesized nano-amorphous Si3N4 powders under pressure of 1.0~ 5.0GPa in temperature range of 25~ 1500℃ has been studied. It has been found that the nano powders exhibit a 'cold sintering' behavior. The nano powders were pressed up to density as high as 93% of the theoretical under 5 GPa at room temperature. The high density is a result of plastic deformation of thenano particles under the ultrahigh-Dressure pressing. The ultra high-pressure sintering with in situ heating showed that when temperature was lower (800~950℃), dense (98%) nano-amorphous Si3N4 bodies whichwere transparent brown in colour were formed while at higher temperature (13300~ 1500℃), densenanocrystalline Si3N4 bodies with microhardness of 15.53~16.05 GPa, which was pure white in color wereresulted. Studies show that the ultrahigh pressure sintering of nano powders can significantly decrease sintering temperature, depress grain growth, which is an effective route for obtaining dense nanostructured materials.Keywrods: nano ceramics Si_3N_4 amorohous ultrahigh pressure sintering

关 键 词：纳米材料 陶瓷材料 非晶 烧结 激光法 

分 类 号：TQ174.65[化学工程—陶瓷工业]