WO_3电极光电化学保护金属铜  

Photoelectrochemical Approach for Copper Corrosion Prevention using WO3 Photoanode

作　　者：朱文彩[1] 高艳[1] 许青[1] 

机构地区：[1]山东教育学院化学与化工系,山东济南250013

出　　处：《山东教育学院学报》2008年第2期82-84,共3页Journal of Shandong Education Institute

摘　　要：采用WO3薄膜电极对金属铜光电化学防腐蚀。考察了光反应体系组成对电极光电响应性能的影响。结果表明:在光电化学电池中,阳极室添加空穴捕获剂如甲酸和升高溶液pH,有利于光电流输出。在阳极室溶液组成为0.5mol.dm-3NaSO4+0.5mol.dm-3HCOOH(pH9.6)时,WO3薄膜电极在光照下可对4mol.dm-3NaCl溶液中金属Cu进行光电化学防腐蚀。WO3 film electrode was used for copper corrosion prevention. The influence of the composition in anode compartment on its photoelectrochemical performance was investigated. The results show that in the presence of hole scavenger formate the photocurrent of the photoelectrode was the highest, and it increased with increasing pH and formate concentration in the anode cell. The photoelectrochemical approach for copper corrosion protection in 4 mol· dm^-3 NaCl solution using the WO3 photoanode under illumination was also achieved. This provides a new approach for achieving photoelectrochemical anticorrosion for metals illumination and thus has wide potential apphcations.

关 键 词：WO3 光照 铜 光电化学防腐蚀 

分 类 号：O64[理学—物理化学]