快速热退火对纳米晶粒SnO2薄膜性质的影响  

EFFECT OF RAPID THERMAL ANNEALING ON PROPERTY OF NANO-SnO_2 THIN FILM

作　　者：秦苏梅[1] 童梓洋[1] 邓红梅[2] 杨平雄[1] 

机构地区：[1]华东师范大学信息学院,上海200241 [2]上海大学分析测试中心,上海200444

出　　处：《红外与毫米波学报》2008年第2期101-104,共4页Journal of Infrared and Millimeter Waves

基　　金：上海市教委科研基金(2006AZ113);上海市教委优秀青年教师科研专项基金;国家自然科学基金(60677022);上海重点学科建设项目(B411)资助项目

摘　　要：以SnC l2.2H2O及无水乙醇为原料,利用溶胶-凝胶法在快速热退火下制备了SnO2纳米薄膜,研究了快速热退火(RTA)对SnO2薄膜性质的影响.采用X射线衍射谱(XRD)、扫描电子显微镜(SEM),研究了薄膜的晶粒尺寸、微结构、表面形貌与快速热退火条件的关联,用傅里叶变换红外光谱(FT-IR)和光致发光研究了薄膜的光学性质.结果表明,快速热退火(RTA)温度对薄膜的光学性质、晶粒尺寸和薄膜的结构形态均有较大的影响.By using SnCl2 2H2O as main materials and ethanol as solvent, nano-SnO2 thin films were prepared by sol-gel technique with rapid thermal annealing （RTA）. The effect of rapid thermal annealing（RTA） on property of nano-SnO2thin film was explored. The size of grains, the microstructure, the morphology and the optical properties of nano-SnO2 thin films were characterized by XRD, SEM, PL and FT-IR. The results indicate that the optical property and the grain-size, the microstructure, and the morphology of the samples change evidently with different temperature of RTA.

关 键 词：纳米二氧化锡 溶胶-凝胶法(sol-gel) 快速热退火(RTA) 

分 类 号：TN304.23[电子电信—物理电子学] TN304.21