APS等离子体离子辅助沉积薄膜工艺  

APS Plasma Ion Assisted Deposition Process for Optical Coating

作　　者：闫凯[1] 司阿利[1] 

机构地区：[1]中国空空导弹研究院,河南洛阳471009

出　　处：《航空兵器》2008年第2期35-38,共4页Aero Weaponry

摘　　要：阐述了APS等离子体离子辅助沉积(PIAD)在光学镀膜中的应用,通过分析APS等离子源辅助沉积过程中离子束的能量传递过程,讨论了各种工艺条件对离子束辅助沉积薄膜特性的影响,给出了APS等离子源辅助沉积薄膜工艺选择的准则。The application of APS plasma ion assisted deposition （PIAD） in optical coating are described. According to the analysis of energy transfer during the APS plasma ion assisted deposition process, the effect of various coating process conditions on coating feather of plasma ion assisted deposition are discussed. Some precepts for choosing the coating parameters of APS plasma ion assited deposition process are proposed.

关 键 词：离子镀膜 薄膜工艺 等离子源辅助沉积 工艺参数 

分 类 号：TN205[电子电信—物理电子学] TJ760.5[兵器科学与技术—武器系统与运用工程]