PLD制备LiMn_2O_4薄膜及参数对薄膜微观结构的影响  

Substrate and Pulse Frequency Effect on the Microstructure of LiMn_2O_4 Thin Films Grown by PLD

作　　者：姜迪友[1] 刘德生[1] 欧阳小芳[1] 叶志清[1] 雷敏生[1] 

机构地区：[1]江西师范大学物理与通信电子学院物理系

出　　处：《江西科学》2008年第2期204-207,318,共5页Jiangxi Science

基　　金：国家自然科学基金(编号:10564002);江西省自然科学基金(编号:0512017);江西省教育科研基金(编号:GJJ(2005)73)

摘　　要：用脉冲激光沉积(PLD),分别在不锈钢和单晶硅(111)衬底上生长了LiMn2O4薄膜,并对所生长LiMn2O4薄膜的结构进行了研究。结果发现,生长在不锈钢衬底上的薄膜具有粗糙的表面和随机的结晶取向,生长在单晶硅衬底上的薄膜具有相对光滑的表面,并具有明显的(111)方向上的择优取向。还研究了脉冲频率和总脉冲数对薄膜生长的影响,结果显示,在相同的沉积条件下,对于不同衬底,LiMn2O4薄膜的生长率不同;脉冲频率对薄膜生长的影响明显,在相同总脉冲数情况下,脉冲频率大,薄膜生长率明显增大。LiMn2O4 thin films were grown via pulsed laser deposition on stainless steel and monocrystalline Si （ 111 ） substrates. The structure properties of LiMn2O4 thin films on both substrates were in- vestigated. Thin films on stainless steel subetrates showed rough surfaces and random orientations, while those on Si substrates showed relatively smooth surfaces and preferred（ 111 ）orientations. The influences of the pulse frequency and total number of the pulses are also studied. Results show that the growth rate can be different for different substrate even with the same deposition conditionsl Furthermore, the pulse frequency is very important to the growth of the film. With the same total number of pulses, the growth rate is large when the pulse frequency is high.

关 键 词：脉冲激光沉积 薄膜 锂离子电池 

分 类 号：O484.43[理学—固体物理]