X射线衍射法研究NiO在不同载体上的状态  

X-ray Diffraction Study of the State of NiO on Different Spports

作　　者：吕光烈[1] 陈林深[1] 凌荣国[1] 黄少铭[2] 唐新硕[2] 

机构地区：[1]杭州大学中心实验室 [2]杭州大学化学系

出　　处：《杭州大学学报（自然科学版）》1990年第3期314-321,共8页Journal of Hangzhou University Natural Science Edition

摘　　要：在SiO_2、TiO_2、γ-Al_2O_3、EDTA-γ-Al_2O_3、CH_3NO_2-γ-Al_2O_3上浸渍负载不同量的NiO,用X射线衍射相定量方法和晶粒大小测定方法研究NiO的状态.NiO有晶态同非晶态二种状态,每100平方米表面积载体上非晶态NiO的阈值:TiO_2上为0.038克,SiO_2上为0.021克,γ-Al_2O_3上为0.129克,EDTA-γ-Al_2O_3上为 0.144克,CH_3NO_2-γ-Al_2O_3上为0.080克.晶态NiO的晶粒大小随晶态量的增加而增大,增大趋势又受载体的孔结构影响.The different amount of NiO was inpregnated on different supports containing r Al2O3, TiO2, SiO2 and on modified r-Al2O3 by EDTA and CH3NO2. The state of NiO was studied by X-ray diffraction phase quantitative analysis and X-ray crystal size measurement. It is shown that NiO on the support surface exists in both crystalline and noncrystalline forms. The amount of noncrystalline NiO has a threshold limit value which is determined by the property of support surface. The threshold limit values on 100m2 support are 0.038g on the TiO2, 0.021g on the SiO2, 0.129g on the r-Al2O3, 0.144g on the EDTA-r-Al2O3, 0.080g on the CH3NO2-r-Al2O3. The NiO in excess of the threshold limit value exists in the crystalline form, it's crystal size growing with the increase of the crystalline quantity but affected by the hole structure of the support.

关 键 词：X射线衍射法 NIO 载体 分散阈值 

分 类 号：O614.813[理学—无机化学]