AlN/CrN纳米多层膜的制备及性能的研究  

On synthesis and properties of nanoscale AlN/CrN multilayered coatings

作　　者：王晖[1] 亢原彬[1] 李德军[1] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300387

出　　处：《天津师范大学学报（自然科学版）》2008年第2期27-30,共4页Journal of Tianjin Normal University：Natural Science Edition

基　　金：天津市科技计划国际合作项目(07ZCGHHZ01500)

摘　　要：采用多弧离子镀技术制备AlN/CrN纳米多层膜,研究了多层膜调制周期对AlN生长结构的影响以及纳米多层膜的机械性能.结果表明:在小调制周期下AlN会以立方结构存在,并与CrN层形成同结构共格外延生长,使纳米多层膜产生较大的晶格畸变;AlN/CrN纳米多层膜硬度和弹性模量随着调制周期的减小呈现上升的趋势,当调制周期小于8 nm时其增速明显增大,并在调制周期为3.8 nm时达到最高硬度35.0 GPa和最高弹性模量405 GPa;AlN/CrN纳米多层膜的硬度和弹性模量在小调制周期时的升高与c-AlN的产生并和CrN形成的共格结构有关.The A1N/CrN multilayered coatings were prepared by using multi-arc ion plating, and the effects of modulation period on the microstructure of A1N and mechanical properties of the coatings were studied. The results showed that A1N had cubic structure at small modulation period and formed the same structure with CrN layers through coherent epitaxial growth, which made serious lattice distortion in the coatings. Accordingly, the hardness and elastic modulus of nanoscale A1N/CrN multilayered coatings increased with the decrease of modulation period, and their values increased more quickly as the modulation period was less than 8 nm. The maximum hardness and elastic modulus were 35 GPa and 405 GPa respectively at the modulation period of 3.8 nm. The increase of hardness and elastic modulus at small modulation period might be caused by the formation of c-A1N and the coherent structure with CrN.

关 键 词：多弧离子镀 A1N/CrN纳米多层膜 硬度 立方氮化铝 

分 类 号：TG174.444[金属学及工艺—金属表面处理] TG174.4[金属学及工艺—金属学]