聚天冬氨酸与钨酸钠复配对白铜B10的缓蚀作用  

Photoelectrochemical Study on the Complex of PASP and Tungstate as Inhibitors of Cupronickel B10′s Corrosion

作　　者：朱律均[1,2] 徐群杰[2] 曹为民[1] 万宗跃[1,2] 周国定[3] 林昌健[4] 

机构地区：[1]上海大学化学系 [2]上海电力学院环境工程系,上海200090 [3]上海电力学院环境工程系 [4]厦门大学固体表面物理化学国家重点实验室

出　　处：《物理化学学报》2008年第5期805-809,共5页Acta Physico-Chimica Sinica

基　　金：国家自然科学基金(20406009);上海市教委重点项目(06ZZ67);上海市重大科技攻关计划(062312045);厦门大学固体表面物理化学国家重点实验室开放课题(200512);上海市重点学科(P1304)资助项目

摘　　要：应用光电化学的方法研究了两种环境友好型缓蚀剂聚冬天氨酸(PASP)和钨酸钠(Na2WO4)的单一配方及其复配对白铜B10在硼砂-硼酸缓冲溶液中的缓蚀作用.研究表明,在光电流循环伏安测试中,单一的PASP与Na2WO4均能够使B10表面Cu2O膜引起的p型光电流响应增大,这说明缓蚀剂增大了Cu2O膜的厚度,使B10的腐蚀速率减小.单一的PASP与Na2WO4的最佳添加浓度分别为3和5mg·L-1,单一的Na2WO4比单一的PASP使p型光电流响应增大趋势更大.若以总浓度为5mg·L-1时对两者进行复配,当PASP与Na2WO4的质量浓度比为1∶1和1∶3时,两者复配比单一使用时的p型电流光响应都更大,B10的腐蚀更小,即缓蚀剂的效果更好.交流阻抗测试结果与光电化学测试相一致.Photoelectrochemical and AC impedance measurements were conducted to study the effects of environment-friendly inhibitors poly-aspartate（PASP）, Na2WO4 and their complex on the corrosion of cupronickel B10 in a borax-buffer solution. The photoelectrochemical measurement results indicated that PASP or Na2WO4 increased the p-type photocurrent which came from the Cu2O layer on the B10 surface. It showed that the inhibitors increased the thickness of the Cu2O layer and decreased the corrosion speed. The optimal concentrations of PASP and Na2WO4 was 3 and 5 mg·L-1, respectively. Na2WO4 increased photocurrent more than mono PASP did. Combined use of PASP and Na2WO4 in a total concentration of 5 mg·L-1, when the mass ratio（PASP： Na2WO4） was 1∶1 or 1∶3, increased the photocurrent more than their individual use did. The bigger the photocurrent was, the better the inhibition efficiency was. When the mass ratio （PASP： Na2WO4） was 3∶1, the combined use increased photocurrent less than their individual use did, the inhibition effect decreased. AC impedance measurement results were well agreed to the photo-electrochemical results.

关 键 词：光电化学 聚天冬氨酸 钨酸钠 白铜B10 缓蚀剂 

分 类 号：TG174.42[金属学及工艺—金属表面处理]