热镀铝锌层铈掺杂硅烷钝化膜的性能  

The preparation and performance research of passivation films of cerium doped in silane of hot dip Al-Zn layer

作　　者：单凤君[1] 刘常升[1] 王双红[1] 齐国超[1] 刘栋[1] 

机构地区：[1]东北大学材料各异性与结构工程教育部重点实验室

出　　处：《材料研究学报》2008年第2期197-200,共4页Chinese Journal of Materials Research

基　　金：国家自然科学基金50674022~~

摘　　要：研究了硝酸铈掺杂双-[r-(三乙氧基硅)丙基]四硫化物(BTESPT)硅烷溶液处理热镀铝锌基体的结构、表面形貌和性能.结果表明,硝酸铈掺杂硅烷溶液与铝锌基体表面发生了化学键合作用,形成Si-O-Al与Si-O-Zn成膜,钝化膜中的主要有机基团与掺杂前没有显著的差别.与铬酸盐膜和未掺杂硅烷的膜相比,硝酸铈掺杂硅烷溶液明显提高了钝化膜的耐蚀性.铈盐掺杂硅烷膜均匀、致密、无明显微裂纹.硅烷膜的主要成分有C、O、Si、S、Al、Zn、Ce,进一步说明Ce^(3+)没有与基体或硅烷中的有机基团反应,只是以物理填充的形式沉积在基体上.The morphology, structure and properties of hot dip Al-Zn substrate pre-treated with bis-[triethoxysilylpropyl] tetrasulfide（BTESPT） doped with cerium nitrate were investigated. The results showed that the BTESPT films doped with cerium nitrate have been successfully deposited by chemical bonding between silane solution and hot dip Al-Zn substrate. The Si-O-Al and Si-O-Zn bonds was formed on the interface. The major organic groups of doped silane films are not significantly different from undoped ones. The corrosion resistance of silane films has been evidently improved in comparison with those of chromate and undoped. The silane films are compact, homogeneous and not rernarkablely tiny cracks. Silane films consisits of C, O, Si, S, Al, Zn and Ce elements. It results further illuminate that cerium ion doesn＇t react to subsrate or organic groups of silane and it is only deposited on substrate by physical fill.

关 键 词：材料失效与保护 钝化 腐蚀电化学 耐蚀性能 

分 类 号：TG174[金属学及工艺—金属表面处理]