纯钛离子氮化层在人工唾液中的耐蚀性  

Corrosion Resistance of Plasma Nitriding Layer on Pure Titanium in Artificial Saliva

作　　者：林乃明[1] 范爱兰[2] 秦林[2] 唐宾[2] 邹娇娟[3] 

机构地区：[1]西北工业大学,陕西西安710072 [2]太原理工大学,山西太原030024 [3]中钢集团西安重机有限公司,陕西西安710077

出　　处：《稀有金属快报》2008年第5期22-26,共5页Rare Metals Letters

基　　金：国家自然科学基金资助(50501016)

摘　　要：用浸泡法和电化学法研究了纯钛(TA2)基体材料及其离子氮化层在人工唾液中的腐蚀行为。浸泡法研究表明,试样随着浸泡时间的延长而增重,而离子氮化层增重明显减缓,其腐蚀速率远小于TA2基材;电化学法研究表明,离子氮化层的自腐蚀电位较TA2基材提高,而腐蚀电流密度和腐蚀速度减小。由失重法和电化学法得出一致结论,离子氮化处理提高了TA2在人工唾液中的耐蚀性。The corrosion behavior of plasma nitriding layer and substrate on pure titanium （TA2） in artificial saliva solution were investigated by immersion test and electrochemical technigue respectively. The results of immersion test show that the weight gain of the specimens increases with prolonging immersing time, while the trend of weight gain of plasma nitriding layer retarded obviously and its corrosion rate is far lower than that of TA2 substrate. Electrochemical measurement results also indicate that compared to TA2 substrate, plasma nitriding layer has higher free corrosion potential, lower corrosion current and corrosion rate. From immersion test and electrochemical experiments, it can come to the conclusion that plasma nitriding improved the corrosion resistance of TA2 in artificial saliva solution.

关 键 词：纯钛 离子氮化 人工唾液 耐蚀性 

分 类 号：TG178[金属学及工艺—金属表面处理]