硫酸盐三价铬镀铬工艺中杂质的影响及去除  

Impurity influence and its removal in process of trivalent chromium plating

作　　者：周智鹏 胡耀红 陈力格 赵国鹏 甘振杰 

机构地区：[1]广州市二轻工业科学技术研究所,广东广州510663

出　　处：《电镀与涂饰》2008年第5期11-13,共3页Electroplating & Finishing

摘　　要：研究了硫酸盐三价铬镀铬工艺中铜、锌、铁、镍离子(含量均为50mg/kg)对镀层外观和厚度、镀液极化的影响,比较了不同除杂方法的除杂效果。结果发现,金属离子杂质对镀液的污染使镀层外观发生变化,使镀层厚度减少、镀液极化增大;金属离子的去除可以采用加入除杂剂和电解相结合的方法。指出六价铬、镀镍光亮剂等杂质对三价铬镀铬工艺影响较大,加入双氧水可以去除六价铬;往循环过滤泵中加入活性炭,可以去除镀镍光亮剂。The influence of impurity of Cu^2＋, Zn^2＋, Ni^2＋and Fe^2＋ （content of 50 mg/kg） on deposit＇s appearance, thickness and bath＇s polarization was discussed in process of trivalent chromium sulfate plating. Impurity removing effects between different impurity removing methods were compared. Results showed that the deposit＇s appearance was bad, thickness was reduced and bath＇s polarization was increased when the bath was polluted by impurities of metallic ions. The metallic ions were removed by method of combined impurity removal agent and electrolysis. It was shown that the impurities of hexavalent chromium and nickel plating brightener have great influence on the process of trivalent chromium sulfate plating and hexavalent chromium can be removed by H2O2, and the nickel plating brightener by adding activated carbon to circle filtration pump.

关 键 词：三价铬镀铬 金属离子 六价铬 镀镍光亮剂 污染 杂质去除 

分 类 号：TQ153.11[化学工程—电化学工业]