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作 者:戴剑锋[1] 李扬[1] 王青[1] 李维学[1] 吴中立[1]
机构地区:[1]兰州理工大学理学院应用物理系
出 处:《甘肃科学学报》2008年第1期76-78,共3页Journal of Gansu Sciences
基 金:甘肃省自然科学基金项目(3ZS062-B25-020)
摘 要:以玻璃为基底,采用溶胶一凝胶法,利用旋涂技术在玻璃表面制备了膜厚小于100nm,粒径在10-30nm之间的纳米TiO2薄膜;利用XRD,AFM系统研究了煅烧温度及膜厚对薄膜亲水性的影响.结果表明,煅烧温度可以控制TiO2薄膜晶相类型,从而强烈影响薄膜的亲水性,煅烧温度为550℃时TiO2薄膜亲水性能达到最佳,经紫外光照2h后接触角为6°;研究还发现TiO2薄膜的亲水性随膜厚增大而提高,当膜厚超过85nm后趋于稳定.Nanometer scale TiO2 film was prepared on glass substrate with film thickness less than 100 nm, crystal size in the range of 10-30 nm by sol-gel process combining with spin-coating technology. The photoinduced super-hydrophilic property of TiO2 film obtained was investigated by the help of XRD and AFM. Parameters like annealing temperature and film thickness affecting the hydrophilic property were systematically studied. The results show that annealing temperature is the important factor affecting the crystal phase, and then strongly affecting hydrophilic property. The best hydrophilic property was obtained when annealing temperature was 550℃. The contract angle of H2O is 6°after 2 h UV irradiation. In addition , it was found that the hydrophilic property was improved with the increase of film thickness,and it finally became invariable when film thickness was over 85 nm.
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