用蒙特卡罗方法研究双层重金属与有机半导体界面的X射线剂量增强  

Monte-Carlo Calculation of X-ray Dose-enhancement-factor Nearby Copper-phthalocyanine Connected Two High Z Metal Interface

作　　者：董文斌[1] 赵广义[1] 赵宝奎[1] 周银行[1] 马玉刚[1] 

机构地区：[1]吉林大学物理学院,长春130021

出　　处：《吉林大学学报（理学版）》2008年第3期524-527,共4页Journal of Jilin University:Science Edition

基　　金：国家基础科学人才培养项目基金(批准号:J0730311)

摘　　要：用蒙特卡罗方法计算不同几何结构的双层重金属对有机半导体界面产生的剂量增强系数,结果表明,X射线在金-酞菁铜-金界面产生与金-酞菁铜界面相似但更大的剂量增强.当半导体层-酞菁铜厚度相同(均为2μm)时,厚度为4μm比厚度为2μm的金产生更大的剂量增强;当金的厚度相同(均为2μm)时,厚度为1μm比厚度为2μm的酞菁铜产生更大的剂量增强.The dose-enhancement-factors of different structure Au-CuPc-Au were calculated by Monte-Carlo method. The results show the dose-enhancement-factors of Au-CuPc-Au are simailer to that of Au-CuPc, but it has larger dose-enhancement-factors than those of Au-CuPc. Under the circumstance （ the thickness of CuPc is 2 μm）, the dose-enhancement-factor of 4 μm gold is larger than that of 2 μm gold. Under the circumstance （the thickness of gold is 2 μm）, the dose-enhancement-factor of 1 μm CuPc is larger than that of 2 μm CuPc.

关 键 词：X射线 有机半导体 剂量增强系数 界面 

分 类 号：O434.1[机械工程—光学工程]