电感耦合等离子体原子发射光谱法测定高纯铌中微量钽  

ICP-AES Determination of Trace Amounts of Tantalum in High Purity Niobium

作　　者：侯列奇[1] 李洁[1] 卢菊生[1] 

机构地区：[1]中国核动力研究设计院核燃料及材料国家重点实验室,成都610005

出　　处：《理化检验（化学分册）》2008年第5期425-426,共2页Physical Testing and Chemical Analysis(Part B:Chemical Analysis)

摘　　要：应用电感耦合等离子体原子发射光谱法，采用标准加入法对高纯铌中微量钽进行测定。当铌的质量浓度为10g·L^-1时，钽的测定范围为50-500μg·g^-1，回收率为101％～103％，相对标准偏差（n=6）为4.0％～7.3％。An ICP-AES method for the determination of trace amounts of tantalum in high purity niobium with standard addition calibration was studied. Range of determination of tantalum was found in the range of 50- 500 μg·g^-1 when concentration of coexisting niobium in the sample solution was 10 g · L^-1. Values of recovery were found in range of 101%-103% and values of RSD＇s （n=6） obtained were in the range of 4. 0%-7. 3%.

关 键 词：电感耦合等离子体原子发射光谱法 标准加入法 高纯铌 微量钽 

分 类 号：O657.31[理学—分析化学]