离子束引起金属膜和白云母界面附着力的改变  

Changes of adhesion of Au and Ag films on muscovite mica induced by MeV ion-beam bombardment

作　　者：杨化中[1] 刘正民[1] 杨坤山[1] 裘元勋[2] 

机构地区：[1]兰州大学 [2]复旦大学

出　　处：《核技术》1990年第8期449-452,共4页Nuclear Techniques

摘　　要：本文叙述了用能量为1—4MeV的Cl离子轰击有Au和Ag薄膜的天然白云母,使金属膜与白云母界面之间的附着力发生了变化。用胶带法测试了不同离子能量下的增强附着剂量阈D_(th)。入射Cl离子的剂量在增强附着剂量阈以上时,界面之间有增强附着力的存在,而在剂量阈以下,发现了附着力的减弱现象。金和白云母系统只测到了一个剂量阈;而银和白云母系统测出了两个剂量阈,用王水腐蚀白云母上的金属膜时,腐蚀时间随照射剂量的增加而延长。C1 ionbeam induced changes of adhesion of thin An and Ag films on muscovite mica substrates have been studied for beam energies ranging from 1.02 to 4.02 MeV and for a wide range of doses. Threshold doses (Dth) of enhanced adhesion for different energies have been measured by the Scotch Tape Test. It is found that after ion bombardment with a dose less than Dth the adhesion of thin metal i m on mica substrate becomes weaker. The lower the Cl ion irradiation dose the more obvious this phenomenon. An acid (aquaregia) corrosion test indicates that the corrosion resisting time of irradiated metal films is prolonged with increase of the Cl ion doses.

关 键 词：CL离子 辐照 金属膜 白云母 剂量阈 

分 类 号：O484.5[理学—固体物理]