Gilch法合成聚对苯乙炔缺陷及分子量的控制  

Control of Defects and Molecular Weight of Ploy(p-phenylenevinylene) Prepared by Gilch Method

作　　者：闫裔超[1] 唐先忠[1] 王姣[1] 黄嘉[1] 

机构地区：[1]电子科技大学电子薄膜与集成器件国家重点实验室,成都610054

出　　处：《材料导报》2008年第6期108-110,115,共4页Materials Reports

基　　金：国家自然科学基金(60771044)

摘　　要：聚对苯乙炔及其衍生物由于具有独特的导电性和荧光特性,目前广泛应用于有机光致器件、激光器件以及光探测器等领域。Gilch法合成聚对苯乙炔材料中往往存在缺陷,这些缺陷对材料及器件的光电性能产生影响。综述了控制PPV凝胶及苄基-二苯乙炔缺陷的方法,介绍了PPV分子量的影响因素。Poly（p-phenylenevinylene） and its derivatives are widely used in the organic light-emitting diodes, laser devices and photodetectors. The different defects in the ploy（p-phenylenevinylene） prepared by the Gilch method have a great influence on the photoelectric properties of materials and devices. In this paper the method that control the amount of gel and tolane -bisbenzyl is introduced. The molecular weight of the ploy（p-phenylenevinylene） has a influence on the wavelength, so in this paper the factors which influence the molecular weight of ploy（p-phenylenevinylene） are also discussed.

关 键 词：聚对苯乙炔 凝胶 苄基-二苯乙炔 分子量 

分 类 号：TN248[电子电信—物理电子学] O632.17[理学—高分子化学]