多阶游程受限光盘母盘刻录的建模与工艺  

Modeling and process of mastering for multi-level run-length-limited optical discs

作　　者：唐毅[1] 宋洁[1] 潘龙法[1] 

机构地区：[1]清华大学光盘国家工程研究中心,北京100084

出　　处：《光学精密工程》2008年第6期1063-1068,共6页Optics and Precision Engineering

基　　金：国家自然科学基金资助项目(No.60677036)

摘　　要：建立了光盘母盘刻录的光刻模型。该模型使用矢量衍射来计算聚焦光斑的光强分布,使用多层薄膜的光传导来描述光在光刻胶中的传播。给出了关键工艺参数,例如光刻胶厚度、显影液浓度和显影时间,实验研究了这些参数对典型坑点的深度和宽度的影响并进行了仿真。研究结果表明,光刻胶厚度的减小会引起宽度的增大和深度的减小。延长显影时间和增加显影液的效果相当,都会引起坑点宽度和深度的增加。实验和仿真结果吻合,两者偏差在±5 nm以内,证明了模型的正确性。分析结果对实际工作中多阶母盘的制备很有参考价值,同时,理论模型还可用于分析其他工艺参数对母盘刻录的影响,或用于分析其他格式光盘的母盘刻录工艺。A photolithographic model for optical disc mastering is established. In this model, vector diffraction is used to calculate the intensity distribution of focused light spot,and the light propagation in multi-layer film structure is used to describe the light propagation in photo-resist. The experimental and simulation results are presented, including the influences of key process parameters on typical multi-level pit width and depth. These process parameters consist of photo-resist thickness, development time and developer concentration. Experimental results show that the decrease of photo-resist thickness will cause the increase of width and the decrease of depth. The increases of development time and developer concentration have the same effect, both will cause the increases of width and depth. The deviation between simulation and experiment is kept within ±5 nm,which shows that the experiment is coincident with the simulation well. The analysis results are helpful to practical multi-level disc mastering. Meanwhile,the model can be used to analyze other process parameters and other disc formats.

关 键 词：光存储 多阶 母盘刻录工艺 光刻模型 

分 类 号：TP333.4[自动化与计算机技术—计算机系统结构]