陶瓷薄膜低温水溶液沉积评述  

An Outline of the Fabrication of Ceramic Film by Low Temperature Deposition from Aqueous Solution

作　　者：欧军飞[1] 周金芳[1] 杨生荣[1] 

机构地区：[1]中国科学院兰州化学物理研究所固体润滑国家重点实验室

出　　处：《材料科学与工程学报》2008年第3期479-484,共6页Journal of Materials Science and Engineering

基　　金：国家自然科学基金(50572107)资助项目

摘　　要：陶瓷薄膜的制备技术多种多样,如物理气相沉积、化学气相沉积、高温烧结和"溶胶-凝胶"法等。这些技术对制备条件都有较高的要求:如高温高真空等。近年发展起来的在低温条件下沉积陶瓷薄膜的技术为我们提供了一种设备简单,在接近室温、常压下可进行操作的方法。本文就这一新兴工艺及其机理进行了评述。There are many techniques for fabricating ceramic films such as PVD, CVD, high-temperature sintering and sol-gel method. These methods require demanding preparation conditions： high temperature, high vacuum and so on. In the recent years, a technique for depositing ceramic thin film at low temperature has offered us a simple way that can be operated at near room temperature and atmosphere pressure. In this paper, the technique and its mechanism are reviewed.

关 键 词：陶瓷薄膜 低温水溶液沉积 生长机理 

分 类 号：TQ174[化学工程—陶瓷工业]