CH4／H2和CH4／He体系等离子体发射光谱分析  

Spectrum analysis of plasma in CH_4/H_2 and CH_4/He systems

作　　者：罗利霞[1] 吴卫东[2] 朱永红[2] 唐永建[2] 

机构地区：[1]包头医学院,内蒙古包头014010 [2]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《强激光与粒子束》2008年第6期899-902,共4页High Power Laser and Particle Beams

基　　金：中国工程物理研究院基金资助课题(2052)

摘　　要：在CH4/H2和CH4/He两种系统中,利用光学发射谱技术对螺旋波放电产生低压甲烷等离子体内活性粒子的光学发射特征进行了原位诊断。在实验中,两种体系下同时都测得的主要荷电粒子为CH,Hα,Hβ,Hγ以及H2等。研究了各实验参数对这些活性粒子CH,Hα,Hβ以及Hγ的发射光谱强度的影响。结果表明:在CH4/H2体系下,随着射频功率的增大,Hα,Hβ,Hγ以及CH基团的相对强度都随着增加,而当放电气压变化时它们都呈现先增大而后减小的趋势。在CH4/He体系下,随射频功率的增加,Hα,Hβ,Hγ以及CH相对强度变化的总体趋势也都是先增加而后减小,当工作气压增加时,Hα,Hβ以及Hγ的相对强度变化也是呈现先增大而后减小,但CH基团的相对强度却是逐渐减小的;这些结果为等离子体沉积各种薄膜过程的理解及制备工艺参数的调整提供了参考。In methane-hydrogen and methane-helium systems, optical emission spectroscopy（OES） is used to diagnose the active species emission in the low-pressure methane plasma by spiral wave discharge. In experiments, the main species as H（Hα,Hβ,Hγ） and CH have been identified in the two systems. In CH4/He system, the intensities of these active species first increased and then decreased with the increase of the input RF power, and as the gas pressure increased, the intensity of the CH radical decreased, the intensities of Hα,Hβ and Hγspecies initially increased and then decreased. In CH4/H2 system, the relative intensities of Hα,Hβ,Hγ and CH radicals increased with the increase of the input RF power, and the relative intensities of all these radicals initially increased and then decreased with the increase of the discharge pressure.

关 键 词：光学发射谱 螺旋波等离子体 甲烷 原位诊断 

分 类 号：TL65[核科学技术—核技术及应用]