高抗激光损伤阈值介孔SiO2减反射膜  

Anti-reflective mesoporous SiO_2 films with high laser-induced damage threshold

作　　者：杨瑜杰[1] 张磊[1] 徐耀[1] 吴东[1] 孙予罕[1] 赵松楠[2] 王海军[2] 吕海兵[2] 蒋晓东[2] 

机构地区：[1]中国科学院山西煤炭化学研究所煤转化国家重点实验室 [2]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《强激光与粒子束》2008年第6期935-938,共4页High Power Laser and Particle Beams

基　　金：国家高技术发展计划项目;国家自然科学基金重点资助课题(20133040)

摘　　要：用P123作模板剂,通过正硅酸乙酯的水解缩聚和溶剂蒸发自组装过程在K9玻璃上制备介孔SiO2膜。应用FT-IR,XRD,N2吸附-脱附,AFM和UV-Vis表征手段研究了薄膜的介孔结构和光学性能,并使用"R-on-1"模式,以Nd:YAG脉冲激光(9.2 ns,1 064 nm)测试了薄膜的激光损伤阈值。结果表明:所镀制单层介孔SiO2膜具有规整的2D p6 mm长周期结构,为SBA-15型,膜层表面比较平整(均方根粗糙度为2.923 nm),在1 064 nm处的透过率为99.5%,换算为激光脉宽为1 ns时,膜层的激光损伤阈值为21.6 J/cm2,显示出了较好的减反性能和抗激光损伤性能。Mesoporous SiO2 film with 2D p6 mm structure was successfully coated on K9 glasses via the hydrolysis-condensation process and the so-called evaporation induced self-assembly process using P123 as a surfactant. The structure and optical properties of the film were characterized with FT-IR,XRD,N2 adsorption-desorption,AFM and UV-Vis. The laser-induced damage threshold of the film was tested with ＂R-on-1＂ model on Nd：YAG laser（9.2 ns, 1 064 nm）. The asrepared single-layer mesoporous SiO2 film was proved to have ordered 2D p6 mm structure, SBA-15 type and average roughness of 2. 923 nm. The film showed high trassimittance of 99.6% at the wavelength of 1 064 nm. The laser-induced damage threshold was 21.6 J/cm^2 when the laser pulse was 1 ns, at wavelength of 1 064 nm.

关 键 词：介孔SIO2 膜 SBA-15 激光损伤阈值 减反性能 溶剂蒸发白组装 

分 类 号：O484.4[理学—固体物理]