不对称交直流电镀电源的研制  

Development of Asymmetric AC/DC Power Supply for Electroplating

作　　者：周晓[1] 郑华均[1] 陈琍[1] 

机构地区：[1]浙江工业大学机电工程学院,310032

出　　处：《电镀与环保》1997年第6期28-30,共3页Electroplating & Pollution Control

摘　　要：利用可控硅技术，研制了一种手动调节式不对称交、直流电镀电源，该电源具有输出稳定、交直流交换方便、不对称比范围广等优点；有效地应用于轴承、轧辊等机械零部件的修复性镀铁，电镀电源性能稳定。By means of thyristor technology,a manually regulating asymmetric AC/DC power supply has been developed,featuring steady output,easy inversion of A.C. and D.C., and wider asymmetric ratio. It can be used in Fe plating for repairing mechanical parts such as bearings and rolls.

关 键 词：电源 可控硅 镀铁 研制 

分 类 号：TQ153.19[化学工程—电化学工业]