氧等离子体处理硬质合金表面对金刚石薄膜附着性能的影响  

Influence of the Cemented Carbide Surface by Oxygen Plasma Processing on Adhesion Capability of the Diamond Film

作　　者：邢文娟[1] 汪建华[1] 王传新[1] 皮华滨[1] 余学超[1] 

机构地区：[1]武汉工程大学湖北省微波等离子体化学与新材料重点实验室,武汉430073

出　　处：《人工晶体学报》2008年第3期689-693,698,共6页Journal of Synthetic Crystals

基　　金：湖北省科技攻关计划(No.2002AA105A02);湖北省教育厅2004年创新团队项目

摘　　要：本文采用微波氧等离子体刻蚀硬质合金基体表面,再利用热的浓碱溶液清除硬质合金表面所形成的氧化物,通过扫描电镜(SEM)观察了试样表面情况,并通过X射线能谱(EDAX)分析了硬质合金表面各成分变化情况。经过预处理的试样采用热丝化学气相沉积(HFCVD)金刚石薄膜,对所沉积出的金刚石薄膜采用SEM观察及压痕测试,发现经过氧等离子体处理的金刚石刀具较两步酸蚀法处理过的金刚石薄膜涂层,其附着性能有较大提高。In this paper,microwave oxygen plasma-etching is used to etch cemented carbide surface and then hot concentrated NaOH solution is performed to eliminate the oxide on the substrate surface.The surface morphology of substrate was observed by SEM.The change of composition of cemented carbides surface was analyzed by EDAX analysis.The diamond films deposited by hot filament chemical vapor deposition（HFCVD）on the pretreated sample surface.The adhesion of the diamond films was tested by indentation testing.The results show that the adhesion of the diamond films tools with microwave oxygen plasma-etching has been greatly enhanced compared with treatment of two-step acid etching.

关 键 词：氧等离子体 金刚石薄膜 硬质合金刀具 附着性能 

分 类 号：O484[理学—固体物理]