金属布线结构对电阻阵列辐射均匀性的影响  

Effect of Metallization Pattern on Radiant Uniformity for Resistor Array

作　　者：陈世军[1] 马斌[1] 

机构地区：[1]中国科学院上海技术物理研究所,上海200083

出　　处：《激光与红外》2008年第7期668-670,共3页Laser & Infrared

基　　金：航空科学基金(No.20060112114)资助

摘　　要：介绍了动态红外场景模拟的电阻阵列单元电路结构,分析了地Vss压降对输出电流的影响。比较了两种不同金属布线的地电位压降,并用Spice软件进行了仿真,对128×128网格状金属布线结构的电阻阵列器件进行了测试,实际验证了仿真结果的可靠性。Pixel drive circuit of resistor array dynamic infrared scene projectors （DIRSP）was introduced, and analyzed the effect of Vss, drop on drive current. Vss drop of two different metallization patterns was compared and simulated with Spice, were tested, simulation were verified by the test of 128 ×128 resistor arrays. Metallization patterns adaptable to different scale resistor array were given in the end.

关 键 词：电阻阵列 动态红外景象 条状布线 网格状布线 

分 类 号：TN386[电子电信—物理电子学]