The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling  

作　　者：方亮 杜惊雷 郭小伟 王景全 张志友 罗先刚 杜春雷 

机构地区：[1]Physics Department,Sichuan University [2]Institute of Optics and Electronics,Chinese Academy of Sciences

出　　处：《Chinese Physics B》2008年第7期2499-2503,共5页中国物理B（英文版）

基　　金：supported by the National Basic Research of China (Grant No 2006CD302900-2);the National Natural Science Foundation of China (Grant No 60676024);the Specialized Research Fund of China for the Doctoral Program of Higher Education (Grant No 20060610006)

摘　　要：The use of an attenuated total reflection-coupling mode of prism coated with metal film to excite the interference of the surface plasmon polaritons （SPPs） was proposed for periodic patterning with a resolution of subwavelength scale. High intensity of electric field can be obtained because of the coupling between SPPs and evanescence under a resonance condition, which can reduce exposure time and improve contrast. In this paper, several critical parameters for maskless surface plasmon resonant lithography are described, and the preliminary simulation based on a finite difference timedomain technique agrees well with the theoretical analysis, which demonstrates this scheme and provides the theoretical basis for further experiments.The use of an attenuated total reflection-coupling mode of prism coated with metal film to excite the interference of the surface plasmon polaritons （SPPs） was proposed for periodic patterning with a resolution of subwavelength scale. High intensity of electric field can be obtained because of the coupling between SPPs and evanescence under a resonance condition, which can reduce exposure time and improve contrast. In this paper, several critical parameters for maskless surface plasmon resonant lithography are described, and the preliminary simulation based on a finite difference timedomain technique agrees well with the theoretical analysis, which demonstrates this scheme and provides the theoretical basis for further experiments.

关 键 词：surface plasmon polaritons （SPPs） ENHANCEMENT interference lithography RESOLUTION 

分 类 号：O53[理学—等离子体物理]