纳米ZnO去除CH_3SH性能的研究  

Study on the performance of nano crystalline ZnO to eliminate CH_3SH

作　　者：邵纯红[1] 孙曙光 李芬[3] 姜安玺[4] 王路[4] 

机构地区：[1]黑龙江工程学院土木系,哈尔滨150050 [2]哈尔滨通力电力控制工程有限公司,哈尔滨150090 [3]哈尔滨理工大学化学与环境工程学院,哈尔滨150040 [4]哈尔滨工业大学市政环境工程学院,哈尔滨150090

出　　处：《黑龙江大学自然科学学报》2008年第3期418-420,共3页Journal of Natural Science of Heilongjiang University

基　　金：国家自然科学基金资助项目(50478026);黑龙江省自然科学基金资助项目(B2007-13);黑龙江省教育厅科学技术研究资助项目(11531298)

摘　　要：在常温、常压条件下,考察了平均粒径分别为14.3nm,21.2nm,24.1nm,35.3nm的ZnO和商品ZnO(约200nm)对CH3SH的去除性能,通过FTIR和XPS等技术对脱硫反应后的试样进行了表征。结果表明,CH3SH主要以分子形式吸附于纳米ZnO表面,并随纳米ZnO粒径的减小,吸附在纳米ZnO表面上CH3SH的FTIR特征峰和硫物种XPS特征峰逐渐增强,CH3SH在纳米ZnO表面进一步脱质子,反应活性逐渐增大,脱硫性能逐渐提高。说明纳米ZnO的表面结构是影响脱硫性能的主要因素。In the normal temperature, the performance of nano crystalline ZnO in average grain sizes of 14.3 nm, 21.2 nm, 24. 1 nm 35.3 nm and commercial used ZnO（about 200 nm） to remove CH3SH is observed. The characterization has been applied to the sample after reaction of desulfurization with the technique of FTIR and XPS. It is illustrated that CH3 SH has been absorbed on the surface of nano crystalline ZnO mainly in form of molecule, with the decrement of grain size of nano crystalline, the characteristic peaks of CH3SH absorbed on the surface of CH3 SH and of sulfur species XPS are increased gradually, and CH3SH brings about the activity of desulfurzation on the surface of ZnO, and thus the performance of desulfurization has been improved. This indicates that the surface structure of ZnO is the main factor affecting the performace of desulfurization.

关 键 词：纳米ZNO 常温 CH3SH 脱硫 

分 类 号：O614.241[理学—无机化学]