ICP-AES分析纳米二氧化硅表面吸附的金属元素含量  

Analysis of the Metal Elements on the Surface of High Purity Nano-SiO_2 by ICP-AES

作　　者：邹亚娟[1] 许实[1] 

机构地区：[1]上海交通大学分析测试中心,上海市闵行区东川路800号200240

出　　处：《光谱实验室》2008年第4期554-556,共3页Chinese Journal of Spectroscopy Laboratory

摘　　要：纳米二氧化硅有着优越的亲水性、稳定性,已广泛应用在涂料、橡胶、医药、造纸等行业。近年来,它又被开发应用到农业,食品等领域。因而,对纳米二氧化硅中有害金属元素和杂质金属元素的检测显得非常重要。本文探索了ICP-AES法检测高纯纳米二氧化硅中Pb、Mn、Zn3种元素含量,实验中得到该方法对3种元素的检出限分别为:0.021、0.0003、0.0057mg/L,三种元素的RSD均小于1%,回收率99%—102%。最后称取3份样品做平行分析检测,得到元素含量基本相同。pharmaceutical Nano-SiO2 has many ascendant.properties, and already applied in coating, rubber, and paper making industries. Recently, its application has been developed into agricultural and food industries. So it is very important to analyze the harmful metal elements and other impurities in high purity Nano-SiO2. The amounts of Pb,Mn and Zn in high purity Nano-SiO2 were determined by ICP-AES. This method can definitely be used in detecting metal elements inNano-SiO2.

关 键 词：电感耦合等离子体-原子发射光谱法 纳米二氧化硅 金属元素 

分 类 号：O657.31[理学—分析化学]