二氧化硅纳米薄膜非平衡热导率研究  

THE STUDY OF NONEQUILIBRIUM THERMAL CONDUCTIVITY OF SILICON DIOXIDE NANO FILM

作　　者：马连湘[1] 王向宁[1] 段占立[1] 王泽鹏[1] 何燕[1] 

机构地区：[1]青岛科技大学,山东青岛266500

出　　处：《低温物理学报》2008年第3期270-273,共4页Low Temperature Physical Letters

摘　　要：二氧化硅纳米绝缘薄膜的传热是靠声子在薄膜的振动实现的.声子在纳米薄膜结构中传输的非平衡性影响了薄膜的热导率.3ω实验方法是一种可以对薄膜热导率进行瞬时测量的方法.本文采用3ω方法分别测量低频率段和高频段的二氧化硅薄膜温升及二氧化硅薄膜的热导率,对二氧化硅薄膜的非平衡热导率进行了分析.The heat transfer of insulation silica nano film relies on the phonon vibration in film. The thermal conductivity of the film is effected by the non-equilibrium of phonon vibration in film structure . The 3ω experimental method is an instant measuring method for thermal conductivity of thin film. The 3ω experimental method is used to measure the temperature rise and the thermal conductivity of silica thin film in low-frequency stage and high-frequency stage. The non-equilibrium thermal conductivity of silica thin film is analysed.

关 键 词：纳米薄膜 热导率 非平衡 

分 类 号：TB383.1[一般工业技术—材料科学与工程]