单色化X射线对薄膜表面高分子降解行为的影响  

Investigation of Degradation Behavior of Polymer on Surface of Film Due to the Existence of Monochromatic X-ray

作　　者：由吉春[1] 李兴林[1] 石彤非[1] 苏朝晖[1] 安立佳[1] 

机构地区：[1]中国科学院长春应用化学研究所

出　　处：《高等学校化学学报》2008年第7期1495-1497,共3页Chemical Journal of Chinese Universities

基　　金：国家自然科学青年基金(批准号:50503022);国家自然科学基金创新研究群体科学基金(批准号:50621302);国家重点基础研究发展规划项目基金(批准号:2003CB615600)资助

摘　　要：Degradation and its temperature dependence of poly(methyl methacrylate)(PMMA) in the blend film of PMMA/SAN were investigated via in-situ X-ray photoelectron spectroscopy(XPS). The results show that thermal degradation of PMMA takes place at 185, 130, 80 ℃ and even room temperature due to the existence of monochromatic X-ray. Furthermore, the degradation rate depends crucially on the experiment temperature.Degradation and its temperature dependence of poly （ methyl methacrylate） （PMMA） in the blend film of PMMA/SAN were investigated via in-situ X-ray photoelectron spectroscopy （XPS）. The results show that thermal degradation of PMMA takes place at 185, 130, 80℃ and even room temperature due to the existence of monochromatic X-ray. Furthermore, the degradation rate depends crucially on the experiment temperature.

关 键 词：单色化X射线 降解 X射线光电子能谱 薄膜表面 

分 类 号：O631[理学—高分子化学]