接近式光刻机间隙分离机构设计  

Design for adjusting gap mechanism in proximity aligner

作　　者：佟军民[1,2] 宁玉伟[3] 严伟[1] 胡松[1] 

机构地区：[1]中国科学院光电技术研究所 [2]河南许昌职业技术学院,许昌461000 [3]河南许昌职业技术学院

出　　处：《机械设计与制造》2008年第7期43-44,共2页Machinery Design & Manufacture

基　　金：国家863面上项目(2006AA03Z355)

摘　　要：为满足接近式光刻设备中基片和掩模间隙分离的要求,设计了微动分离间隙机构。该结构由螺旋差动机构和杠杆机构组成。采用两同轴且旋向相同,螺距分别为0.7mm和0.8mm的差动螺旋副实现2μm的微动分辨力,进一步经1:2杠杆位移缩小机构实现1μm的间隙分离微调分辨力。试验表明,该机构达到了设计要求,满足了工作需要。In order to meet the demand of adjusting gap between substrate and mask in proximity aligner,micro-motion adjusting gap mechanism was designed. The mechanism was composed of differential screw mechanism and lever mechanism. 2μm micro-motion resolution was carried out by a differential screw made up of two coaxial-machine screw of different pitch and same rotated clockwise ,1μm micromotion adjusting gap resolution was carried out by 1 ： 2 lever mechanism again. Testing result was shown that it reaches the designed requirements and can satisfy the needs in the work.

关 键 词：接近式光刻机 螺旋差动机构 微动分辨力 

分 类 号：TH12[机械工程—机械设计及理论]