掺硼金刚石厚膜电极污水处理实验研究  

Experimental Study on Boron-Doped Diamond Thick Film as Electrode for Wastewater Treatment

作　　者：陈兴峰[1] 戴军之[1] 黄铭敏[1] 左敦稳[1] 周亮[1] 康静[1] 

机构地区：[1]南京航空航天大学机电学院,江苏南京210016

出　　处：《机械制造与自动化》2008年第4期12-14,32,共4页Machine Building & Automation

基　　金：南京航空航天大学2006年度校大学生创新基金(项目编号:Z060209);2007年度江苏省高等学校大学生实践创新训练计划项目资金

摘　　要：在EACVD(electron-assisted hot filament chemical vapor deposition)金刚石膜沉积系统上制备出了掺硼金刚石厚膜电极,采用循环伏安法研究了掺硼金刚石厚膜电极和IrO2/Ta2O5钛涂层电极电化学性能的差别,结果表明掺硼金刚石厚膜电极具有比IrO2/Ta2O5钛涂层电极更宽的电势窗口(约3.4 V)和更低的背景电流(接近于零)。用所制备的掺硼金刚石厚膜电极和IrO2/Ta2O5钛涂层电极对比处理高浓度难降解污水,通过测定污水处理过程中化学需氧量(chemical oxygen demand,COD)的变化、观察污水处理过程中颜色的变化、处理前后两电极的SEM照片研究了掺硼金刚石厚膜电极在污水处理中的应用,试验表明掺硼金刚石厚膜电极比IrO2/Ta2O5钛涂层电极处理污水效率更高、处理高浓度难降解污染物的能力更强,电极更加稳定、耐腐蚀性更好,是一种很有应用前景的电极。Boron doped diamond thick film electrode is prepared in a self-made EACVD system. The performance is compared and investigated between the electrochemical property of boron doped diamond thick film and one of traditional coated titanium electrode material. The results show that the boron doped diamond thick film has wider electrochemical window （ approximate ：3.4V） and lower background current （near zero） than IrO2/Ta205 coated titanium electrode. Seriously polluted water can be treated with the boron doped diamond thick film electrode and IrOz/Ta205 coated titanium electrode. The experiment results demonstrate that the COD of the wastewater treated with the diamond electrode decreases more quickly than that with the coated titanium one. It is also shown that the boron doped diamond electrode is has higher efficiency and more stability as well as better corrosion resistance. It can be sure that it is a very promising electrode.

关 键 词：掺硼金刚石膜电极 电化学性能 污水处理 化学需氧量 

分 类 号：TB321[一般工业技术—材料科学与工程] X703[环境科学与工程—环境工程]