氮含量对脉冲偏压电弧离子镀CN_x薄膜结构与性能的影响  

EFFECT OF NITROGEN CONTENT ON THE MICROSTRUCTURE AND PROPERTIES OF CN_x FILMS DEPOSITED BY PULSED BIAS ARC ION PLATING

作　　者：李红凯[1] 林国强[1] 董闯[1] 闻立时[1] 

机构地区：[1]大连理工大学三束材料改性国家重点实验室,大连116085

出　　处：《金属学报》2008年第8期917-921,共5页Acta Metallurgica Sinica

基　　金：国家高技术研究发展计划资助项目2006AA032521~~

摘　　要：用脉冲偏压电弧离子镀设备在保持脉冲偏压一致和工作气压恒定的条件下,控制不同氮流量在硬质合金基体上制备了不同氮含量的CN_x薄膜,用SEM,GIXRD,XPS,激光Raman谱和纳米压入等方法分别研究了薄膜的表面形貌、成分、结构与性能.结果表明,随着氮流量的增加,薄膜中氮含量先是线性增加然后趋于平缓,薄膜呈非晶结构且为类金刚石薄膜,其硬度与弹性模量随着氮含量增加先增加后下降,在x=0.081时出现最大值,分别为32.1 GPa和411.8 GPa.分析表明,通过氮含量的改变而使sp^3键含量发生改变是影响薄膜性能变化的重要因素。The uniform, smooth and dense CNx films with x ≤0.189 were deposited on cemented carbide substrate at different nitrogen flow rates by pulsed bias arc ion plating. The surface morphology, composition, structure, hardness and elastic modulus of CNx films were observed and measured by SEM, GIXRD, XPS, Raman spectra and nanoindentation, respectively. The result shows that the nitrogen content in the CN~ films increases linearly and then slowly with the nitrogen flow rate increasing. The XRD result indicates that the deposited films were amorphous. The hardness and elastic modulus increase and then decrease with nitrogen content increasing. The hardness and elastic modulus of the film with x=0.081 reach the maximum values of 32.1 GPa and 411.8 GPa, respectively. The Raman spectra results suggest that the deposited films have the typical characteristic of diamond-like carbon films. The ID/IG ratio decreases and then increases with increasing nitrogen content, and the minimum value, which corresponds to the highest sp3 content, was obtained at x=0.081. The change of spa content by adjusting the nitrogen content in the CNx films is the important factor that influences the hardness of the films.

关 键 词：氮化碳薄膜 脉冲偏压 电弧离子镀 结构 力学性能 

分 类 号：TB43[一般工业技术]