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机构地区:[1]山东轻工业学院材料科学与工程学院,山东济南250353
出 处:《化工进展》2008年第9期1435-1438,共4页Chemical Industry and Engineering Progress
基 金:山东省自然科学基金项目(Y2005F28)
摘 要:采用溶胶-凝胶法、相分离及自组装技术,以正硅酸乙酯(TEOS)为硅前体,在硅溶胶中添加聚丙烯酸(PAA)引发相分离,通过控制PAA的含量来控制相分离的程度,从而制备出表面微结构可控制的SiO2薄膜。研究了聚丙烯酸含量对薄膜表面微结构及接触角的影响。用扫描电镜(SEM)对薄膜表面进行了表征,结果表明,SiO2薄膜表面粗糙度随着聚丙烯酸含量的增加而增加。最后用三甲基氯硅烷(TMCS)进行化学气相修饰,形成TMCS自组装单分子层,制备出接触角达158°的超疏水SiO2薄膜。Super-hydrophobic SiO2 thin films were prepared by sol-gel processing, a phase separation and self-assembly technique. Tetraethylorthosilicate (TEOS) was taken as the resource of silica and polyacrylic acid (PAA) was added to induce phase separation. The mircrostructure evolution of the silica films were controlled by phase separation which was enhanced properly by the addition of PAA. The effect of PAA agent on mircrostructure and the contact angle of SiO2 films were investigated. The surface of thin films was characterized with SEM. The results showed that the surface roughness of SiO2 thin film increased with the addition of PAA. After the films were modified by chemical vapor deposition of trimethylchlorosilane (TMCS), a self-assembled monolayer of trimethylchlorosilane was formed on the films and SiO2 thin films with super-hydrophobic property with water a contact angle as high as 158° were obtained.
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