磁性薄膜高频特性研究进展  

Research Progress on High Frequency Characteristics of Magnetic Thin Films

作　　者：巩英明[1] 

机构地区：[1]中国电子科技集团公司第九研究所,四川绵阳621000

出　　处：《磁性材料及器件》2008年第4期8-11,共4页Journal of Magnetic Materials and Devices

摘　　要：对国内外近年来在磁性薄膜高频特性的研究进展进行了较为系统的总结。包括单层膜到多层膜的转变促进高频特性的改善;不同材料对(金属层/绝缘层)对多层膜高频特性的影响;一些特殊材料薄膜的高频特性;退火效应对磁性薄膜高频特性的影响;薄膜的微结构和薄膜特性的关系等几方面。Research progress of recent years on high frequency characteristics of magnetic thin films were summarized systematically. The covered aspects includes the improvement of high frequency characteristics by changing single layer to multi-layer films; the effect of different material pair （metal layer/insulation layer） on the high frequency characteristics of multi-layer films; the high frequency characteristics of some special film materials; the effect of annealing on the high frequency characteristics of magnetic thin films; and the dependence of the film characteristics on its microstructrue, etc.

关 键 词：磁性多层膜 高频特性 退火效应 

分 类 号：O484.43[理学—固体物理]