改进的遗传算法在粒径测量中的应用  

Application of Improved Genetic Algorithm in the Particle Sizing Technique

作　　者：张虎[1] 戴景民[1] 唐红[1] 辛春锁[1] 

机构地区：[1]哈尔滨工业大学自动检测与过程控制系统研究所,哈尔滨150001

出　　处：《光电工程》2008年第9期50-54,共5页Opto-Electronic Engineering

摘　　要：在光全散射法粒径测量中,基于改进的遗传算法反演颗粒系的粒径分布。在独立模式下,粒径反演为求解约束优化问题,将改进的遗传算法与模拟退火算法相结合,克服了罚函数遗传算法反演时罚系数难以确定以致极易产生不可行收敛解的不足。在非独立模式下,采用改进的遗传算法能够在3个波长下较准确地反演粒径分布。在光全散射法中采用改进的遗传算法反演粒径分布是可行的,反演结果稳定可靠,避免了基本遗传算法容易过早收敛而使反演结果陷入局部解的缺陷。In the total light scattering particle sizing technique, a method based on the improved genetic algorithm is proposed to be applied to the inversion of particle size distribution. In the independent model, the improved genetic algorithm combined with simulated annealing algorithm overcomes the difficulties of determining the penalty coefficient of genetic algorithm based on the penalty function, which will cause the inversion result to be an infeasible solution. In the dependent model, the size distribution is well determined at only three wavelengths by the improved genetic algorithm. It is feasible to use the improved genetic algorithm to recover the particle size distribution in the total light scattering technique and the inversion results are steady and reliable, which avoids the defects that the simple genetic algorithm is easy premature and then the inversion result is easily trapped in a local solution.

关 键 词：粒径测量 光全散射法 粒径分布 改进的遗传算法 

分 类 号：TH744[机械工程—光学工程]