金属有机化合物化学气相淀积含钛硬质涂层的过程研究  

Process Study of Hard Coatings Containing Titanium by Metallo-Organic Chemical Vapour Deposition (MOCVD)

作　　者：周定为 韩杰[1] 陈敏恒[1] 

机构地区：[1]华东化工学院联合反应工程研究所技术化学物理研究室

出　　处：《华东化工学院学报》1990年第4期365-370,共6页

摘　　要：在垂直冷壁CVD反应器中进行了文题的探索性研究。以二乙胺基钛(Ti(NEt_2)_4)为源,在不锈钢或硬质合金基体上完成了氮化钛(TiN)和碳氮化钛(Ti(C,N))硬质薄膜低温下的淀积。发现(TiN)和(Ti(C,N))分别在773K和973K下形成;在操作范围内整个反应器流场由自由对流控制;反应过程由表面过程控制;反应活化能为235 kJ/mol;二乙胺基钛反应级数为1级。进行了热力学计算,提出了反应历程假设。结果表明:用二乙胺基钛进行MOCVD淀积含钛硬质薄膜可以降低温度,以扩大基体的选用范围,为获得硬质薄膜提供了一条新的途径。An explorative study of hard and multifunction coatings by MOCVD in vertical cold-wall chemical vapour deposition reactor is carried out. Titanium nitride (TiN) and titanium carbonitride (Ti(C,N,)) are formed on stainless steel substrate at. 773. K and 973 K respectively when titanium tetrakisdiethylamide is used at temperature lower than when titanium tetraehloride used. Under the operation conditions, they are verified that the flow pattern is dominated by free convection, deposition is brought about by surface reaction and the reaction activation energy is 237 kJ/mol. Through thermodynamical computation, the mechanisms of chemical reaction at different temperature are proposed.

关 键 词：氮化钛 硬质涂层 化学气相淀积 

分 类 号：O614.411[理学—无机化学]