13．9和19．6nm正入射Mo／Si多层膜反射镜的反射率测量  

Reflectivity measurements of normal-incidence Mo/Si multilayer mirrors at 13.9 and 19.6 nm

作　　者：李敏[1] 董宁宁[1] 刘震[1] 刘世界[1] 李旭[1] 范鲜红[1] 王丽辉[1] 马月英[1] 陈波[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室

出　　处：《光学精密工程》2008年第9期1666-1672,共7页Optics and Precision Engineering

基　　金：国家自然科学基金资助项目(No.40774098No.60677043)

摘　　要：为了进一步研究13.9 nm类镍银和19.6 nm类氖锗X射线激光,制备了工作在上述两个波长的Mo/Si多层膜反射镜。设计了结构简单、操作方便的小型反射率计,将其安装在Mcpherson247单色仪出射狭缝附近,以铜靶激光等离子体辐射源为极紫外光源,组建了一套适合反射率测量的实验装置,利用此装置测量了实验室制备的多层膜反射镜的反射率。测量之前对单色仪进行了标定并对光源稳定性进行了测量,结果显示,波长准确度是0.08 nm,光源信号抖动范围<5%,光源稳定性好。反射率测量结果显示,实验室能够制备出中心波长分别是13.91和19.60 nm的Mo/Si多层膜反射镜,相应反射率分别为41.9%和22.6%,半宽度为0.56和1.70 nm。同时还用WYKO测量得到13.9和19.6 nmMo/Si多层膜的表面粗糙度分别为0.52和0.55 nm。To satisfy the requirements of 13.9 nm Ni-like Ag and 19.6 nm Ne-like Ge X-ray laser researches, Mo/Si multilayer mirrors were prepared,and a small and simple structure reflectometer easy to operation was designed. A refleetivity-measuring system consisting of a refleetometer,a Mcpherson 247 monochromator and a Extreme Ultraviolet（EUV）radiation source from copper-target Laser Produced Plasmas（LPP） was established. The calibration precision of the monochromator was 0.08 nm and the intensity variance of the LLP source was lower than 5 %. The experimental results show that the reflectivities of Mo/Si multilayer mirror at 13.9 and 19.6 nm are 41.9% and 22.6%, the related FWHMs are 0.56 and 1.70 nm, respectively. The measurement of surface roughness was carried out using WYKO, which are 0.52 nm for 13.9 and 0.55 nm for 19.6 nm.

关 键 词：Mo/Si多层膜反射镜 反射率测量 表面粗糙度 极紫外光源 激光等离子体光源 

分 类 号：O484.5[理学—固体物理] TH741.4[理学—物理]