氧化铬薄膜的界面高分辨研究  

Interfacial Microstructures of Chromium Oxide Coatings

作　　者：庞晓露[1] 高克玮[1] 杨会生[1] 王燕斌[1] 

机构地区：[1]北京科技大学材料物理与化学系,北京100083

出　　处：《真空科学与技术学报》2008年第5期420-423,共4页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金(No.50471091)

摘　　要：氧化铬薄膜具有高的硬度,很好的耐磨、耐蚀性能,因而具有广泛的应用。但是到目前为止还没有看到对其微观结构研究的报道。本文通过扫描电镜、高分辨电镜及原子力显微镜研究了氧化铬薄膜及界面的微观结构。研究发现,在铬过渡层和基体的界面及氧化铬薄膜与铬过渡层间观察到约100 nm厚的非晶态铬和氧化铬,在铬过渡层和基体的界面中存在有Fe—Cr中间相。非晶层的出现为制备涂层表面光滑、晶粒细小、内应力降低、且具有较高厚度的薄膜提供了一个全新的思路。The multilayered chromium oxide coatings, Cr/Cr2O3, were deposited on low carbon steel substrates by RF reactive magnetron sputtering. The micmstmctures and mechanical properties at the interfaces of the multilayer and the substrate were characterized with seanning electron microscopy, （SEM）, high resolution transmission electron miemscopy （HRTEM）, and atomic rome microscopy （AFM）. The results show that the intermediate phases of Fe and Cr exist at the interface of Cr tranition layers and the substrate; and that amorphous chromium and its oxide layer , about 100 nm in thickness, reside at both the interface of the Cr and steel, and the interface of the Cr transition layer and Cr oxides. We suggest that the amorphous Cr and amorphous Cr oxides result in smooth and compact surfaces, with freer grains and lower residual stress, of the coatings.

关 键 词：Cr/Cr2O3膜 界面微观结构 非晶结构 高分辨电镜 原子力显微镜 

分 类 号：TB43[一般工业技术]