锂掺杂ZnO陶瓷靶材制备及其掺杂引起的缺陷  

Fabrication and Li-Related Impurity of ZnO Ceramic Target

作　　者：唐立丹[1] 顾有松[1] 张跃[1] 刘邦武[1] 杨亚[1] 秦子[1] 

机构地区：[1]北京科技大学材料物理与化学系,北京100083

出　　处：《物理化学学报》2008年第9期1597-1601,共5页Acta Physico-Chimica Sinica

基　　金：国家重点基础研究发展计划(2007CB936201);科技部国际科技合作计划项目(2006DFB51000);国家863计划(2006AA03Z351);国家自然科学基金国际合作与交流项目(重大)(50620120439)资助

摘　　要：采用燃烧合成和放电等离子烧结方法制备锂掺杂ZnO陶瓷靶材.利用XRD,SEM,TEM和激光粒径分析等手段分析合成粉体与陶瓷的显微结构.结果表明,锂掺杂ZnO粉体与陶瓷均为纤锌矿结构,无其他相存在;粉体的粒径分布为0.18-1.7μm,烧结体致密度较高,晶粒尺寸为1-3μm.此外,分析锂元素在烧结过程中引起掺杂缺陷变化,锂元素由ZnO晶格的间隙位置转移为替代锌晶格位置,实现受主掺杂,为实现p型ZnO薄膜的制备奠定基础.Li doping ZnO powders had been synthesized by using carbamide and glycine as fuel and zinc nitrate as oxidant. And then the as-synthesized powders were sintered by spark plasma sintering （SPS）. XRD, SEM, and TEM were employed to characterize the microstructure and phase. The results showed that both Li doping ZnO powders and cramic were wurtzite without any other phases, the grain sizes of the powder and ceramic were 0.18-1.7 μm and 1-3 μm with high density, respectively. Li-related defect in the ZnO was studied by XRD analysis. Li element occupied an interstitial site in ZnO powders and a substitutional site in ZnO target, a consequence of the Zn^2＋ ion being replaced by Li^＋, which introduced an acceptor level into the crystal. The results showed that the Li doping ZnO ceramic used as sputtering target was beneficial to the preparation of p-type ZnO film.

关 键 词：燃烧合成 放电等离子烧结 Li相关缺陷 

分 类 号：TQ174.1[化学工程—陶瓷工业]