铁钝化膜厚度的电化学和光电化学测量  

Electrochemical and Photoelectrochemical Measures of the Thickness of Iron Passive Film

作　　者：张国栋[1] 郭万华[1] 姚文锐[1] 

机构地区：[1]华东冶金学院化学工程系

出　　处：《华东冶金学院学报》1990年第4期46-50,45,共6页

摘　　要：本文用电化学和光电化学方法研究了在硼酸/硼酸钠溶液中铁钝化膜厚度和成膜电位的关系。指出铁钝化膜由两层氧化物组成,内层为具有导电体性质的Fe_3O_4,外层为具有半导体性质的Fe_2O_3,在钝化区的电位范围内,内层Fe_3O_4的厚度和成膜电位无关,而外层Fe_2O_3的厚度和成膜电位成正比关系。The thickness of the passive film on iron formed in pH=8.4 boric acid/borate solution has been measured by the electro-chemical and the photoelectrochemical methods. The dependence of the thickness of the iron passive film on the filmforming potential has been discussed. Resultr indicated that iron passive film consists of an inoer Fe_3O_4 and an outer Fe_2O_3 layer at the passive potential region, the thickness of inner Fe_3O_4 layer is not affected by the film-forming potential φ and the thickness of outer Fe_2O_3 layer is proportional to the film-forming potential φ.

关 键 词：铁钝化膜 双层结构 膜厚测量 

分 类 号：TQ153.6[化学工程—电化学工业]