掩膜成像法在LiNbO_3:Fe晶体制作缺陷态光子晶格  

Fabricating Defective Photonic Lattices in LiNbO_3:Fe Crystal By Mask-Imaging Method

作　　者：张宝光[1] 杨立森[1] 陈宝东[1] 崔俊杰[1] 付存宝[1] 何冬梅[1] 

机构地区：[1]内蒙古师范大学物理与电子信息学院,呼和浩特010022

出　　处：《信息记录材料》2008年第5期16-20,共5页Information Recording Materials

基　　金：内蒙古师范大学研究生科研创新基金(YJS07022);国家自然科学基金(60467002)资助项目

摘　　要：在用掩膜法制作光子晶格的实验中,我们分别在薄、厚LiNbO3:Fe晶体中成功地制作了带有缺陷的(2+1)维光折变光子晶格且比较了二者的异同,并结合透镜成像的相关理论找出了造成这些异同的因素,又对这些因素做了详细的分析。这对更好的利用掩膜成像法制作光折变光子晶格有一定的指导意义。In the experiment of the production of photonic lattice which by Mask-Imaging Method, we have successfully produced a defective （2＋1） -dimensional photorefractive photonic lattice in thin and thick LiNbO3：Fe Crystal respectively, and done some comparison of the two case. combined with the theory of lens imaging we have found some factors which caused the differences between the two case, and do detailed analysis toward these factors, it is quite impor- tant to use the Mask-Imaging Method to produce photorefractive photonic lattice more efficiently in the future.

关 键 词：掩膜成像法 LINBO3:FE晶体 缺陷 光子晶格 分立度 

分 类 号：O434.19[机械工程—光学工程]