一种新颖的受工艺参数影响较小的基准电流源  

Novel Current Reference Source with Little Influence by Process Parameter

作　　者：张慕辉[1] 刘诗斌[1] 唐秀清[1] 叶侃[1] 

机构地区：[1]西北工业大学电子信息学院,陕西西安710072

出　　处：《计算机测量与控制》2008年第9期1348-1349,1355,共3页Computer Measurement &Control

基　　金：西安应用材料创新基金资助资助项目(XA-AM-200707);西北工业大学基础研究基金资助项目(w018104)

摘　　要：针对传统电流源受工艺参数影响较大的问题，提出了一种利用电压差平方电路来解决这个问题的思路；设计了一种新颖的受工艺参数影响较小的基准电流源电路，该电路采用0．6μm的BiCMOS工艺设计，利用Hspice进行仿真验证；结果表明，该电路在典型边界条件下-40℃～85℃范围内输出基准电流温度系数为17ppm／℃，变化率约0．2％，在6种不同边界条件下输出基准电流变化约为±1．72％。Conventional current source is greatly impacted by the process parameter. A voltage difference square circuit is used to solve the problem, and a novel reference current source circuit with little influence by process parameter is put forward. Using Hspice based on 0.6μm BiCMOS process model, the simulation results show that in the typical corner, the current reference has a temperature coefficient of 17ppm/℃ and the variation can be kept within 0.2% in a temperature range from -40℃ to 85℃; the current reference variation is about ± 1.72 % , with corner tolerance analysis.

关 键 词：带隙基准 基准电流源 电压差平方电路 

分 类 号：TP331[自动化与计算机技术—计算机系统结构]