强流静电会聚电子枪系统计算机模拟研究  

Computer Simulation of High Electron Beam E-Gun Focused by Static Electric Field

作　　者：罗德均[1] 祁康成[1] 林祖伦[1] 李新义[1] 

机构地区：[1]电子科技大学光电信息学院,成都610054

出　　处：《电子器件》2008年第5期1542-1545,共4页Chinese Journal of Electron Devices

摘　　要：轻、小型层流电子枪在电子束焊接,微波器件等方面具有广泛的应用,希望得到稳定的、环形分布且会聚良好的电子束。但传统电子枪的聚焦系统如磁聚焦或电磁混合聚焦存在结构复杂、重量大的缺点。我们采用具有优异电子发射和抗中毒能力的LaB6作为阴极材料,纯静电聚焦的方式进行仿真、设计。经过理论探讨和计算机模拟仿真,在5000V总电压下,输出300mA强流电子束,导流系数达到了3.35μA/V3/2。为下一步具体的结构设计提供了可靠依据。Light, small scale laminar e-guns are widely used in electron beam welding, microwave devices etc. Well focused e-beams with steady annular disfribution are expected. The traditional focusing systems are the complicated and heavy structure, such as magnetic or electrical-magnetic hybrid focusing systems. LaB6 is taken as cathode materials due to its outstanding qualities of electron emission and anti-poisoning. We propose the structure of pure static electric field focusing system, which simplified the structure and reduced its weight. After theoretical discussion and computer simulation, 300 mA electron beam current with perveance of 3.35 μA/V3/2 at 5 000 V total voltage is produced. The jobs provide reliable supports to the following structure design of total system.

关 键 词：电子光学 计算机仿真模拟 PIC(particle-in-cell)方法 强流电子枪 静电会聚 

分 类 号：TL501.7[核科学技术—核技术及应用]