激光划痕法膜基界面的温度场及应力场分析  

Study on temperature and stress field of film-substrate system irradiated by laser scratching

作　　者：冯爱新[1] 程昌[1] 殷苏民[1] 周建忠[1] 唐翠屏[1] 

机构地区：[1]江苏大学机械工程学院,镇江212013

出　　处：《激光技术》2008年第5期527-530,共4页Laser Technology

基　　金：国家自然科学基金资助项目(50405035);江苏省研究生创新计划资助项目(XM04-24;XM05-32);江苏省自然科学基金资助项目(BK2007512);先进数控机床技术江苏省高校重点实验室开放基金资助项目(KXJ07126)

摘　　要：为了对膜基系统的温度分布和应力分布进行模拟研究,采用ANSYS有限元分析软件,对高斯移动激光加载条件下TiN薄膜的温度场和由温度场产生的应力场进行了稳态分析。研究结果表明,温度场随激光光源的移动而移动,温度场中温度最大点在激光光斑中心处,且激光光源移动方向后方的温度场有较大的迟滞现象。在膜基系统中产生的应力场主要集中在薄膜内部。温度场和应力场的研究对探讨膜基系统失效进程具有重要意义。The temperature and stresses distributions on film systems were simulated. A steady-state analysis of the temperature field and stress field of TiN film irradiated by a moving Gaussian laser was made with finite element analysis program. As a result, the temperature field is moving along with the lamp house, the largest temperature of temperature field is in the center of laser facula, and there is an obvious sluggish phenomenon in the backside temperature field of laser facula moving way. The stress field of film-substrate mainly concentrates in the film. The study of temperature and stress field is important for the research of film shape deformation.

关 键 词：激光技术 温度场 应力分布 有限元法 薄膜 

分 类 号：O484[理学—固体物理]