完全膜沸腾表面汽化率的测量及数值分析  

Measurement of surface evaporating rate of complete film boiling and numerical analysis

作　　者：徐宁[1] 严亮[1] 徐斌[1] 王思慧[1] 潘永华[1] 周惠君[1] 朱兵[1] 

机构地区：[1]南京大学物理学系,江苏南京210093

出　　处：《物理实验》2008年第10期43-46,共4页Physics Experimentation

基　　金：国家基础科学人才培养基金(No.J0630316)

摘　　要：通过在高温铜板表面上滴加酒精可产生稳定的完全膜沸腾现象.测量了液滴体积与完全汽化时间曲线,得出完全膜沸腾时,下表面的蒸发占体积减少的主要部分,并通过建立数学模型确定了下表面蒸汽膜处的蒸发速率.By dropping ethanol drops on a heated copper surface, the stable phenomena of complete film boiling is achieved. From the relationship between volume of-the droplet and completed evaperation time, the evaporating rate of droplet＇s bottom is much larger than that of the top. With a simplified model of droplet, the numerical value of the bottom evaporating rate is achieved.

关 键 词：完全膜沸腾 表面汽化率 蒸汽膜 大液滴模型 

分 类 号：O414.12[理学—理论物理]